Electroplating Titanium Copper Thin Films: Serious Peel-Off Issue

Summary for electroplating titanium copper thin films Discussion

Electroplating onto sputtered titanium and copper thin films is causing the whole metal stack to peel from the alumina substrate, even though the sputtered Ti/Cu layer adheres well before plating. The questioner, Shrikant Kulkarni, says the process uses 60 nm titanium and 400 nm copper on alumina, then copper, nickel, and gold are plated from an acid copper sulfate bath or copper Rochelle salt bath, followed by a nickel sulfamate bath. The thread title indicates the problem is that electroplating pulls the sputtered film off. Because the excerpt provided contains only the question and no answers, there is no documented diagnosis or remedy in the source text to summarize beyond the reported failure mode and process details.

Q. Hello,
I am facing an issue in electroplating of copper, Nickel and Gold over the sputtered thin film of Titanium and Copper on Alumina substrate. We are depositing 60nm Titanium and 400nm of copper. Our Titanium and Copper have perfect adhesion with each other and Alumina substrate when it is sputtered. However, when we do the electroplating of copper/Nickel on this layer, the sputtered film get pilled off from Alumina substrate. Please let me know, the probable reasons behind this and how we can prevent this pilling of sputtered thin film. We are using acid copper sulphate

on

eBay or
Amazon [affil link] bath or copper Rochelle salt bath for copper electroplating and Nickel sulfamate bath for Nickel deposition.

Thank you in anticipation

SHRIKANT KULKARNI
– PUNE INDIA
September 9, 2023