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Selective removal of AlF and AlxOyFz contaminants from anodize surface

Q. We are a cleaning company responsible for refurbishment of semiconductor parts and materials. We have hard anodized aluminum parts that have been exposed to fluorine plasmas and the aluminum oxide surface becomes partially fluorinated and forms a white powder. If it were fully fluorinated aluminum this would not be an issue but the compound that is formed is very resistant to most cleaning agents you can use on anodize materials without destroying the anodize coating.

Does anyone have any experience removing this contaminant using a selective chemical etch?

Reed Rosenberg
BOC Edwards - Phoenix, Arizona, USA
2006

Q. I'd be very interested in the response to this as well. The AlF is killing us.

Terence Collier
- Dallas, Texas
2006

Has the composition been identified? How thick is this modified layer?

Barry Chen
- Danbury, Connecticut, USA
2007

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