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Cobalt Nickel electroless plating

I am trying to deposit ternary alloy (CoNiP) on Aluminum substrate patterned on Silicon oxide. I am using Hypophosphite bath, pH = 7-9, temperature 80-90 °C. The pretreatment steps are: cleaning with acidic solution, Single/Double zincation. The problem is that the plating process results in global plating (i.e., the film grows every where on the Aluminum surface and on the Silicon oxide as well). Any idea?.

Qasem
Student - Singapore
2003

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One of the attributes of electroless plating is that it goes onto any surface. You may need to consider selective electroplating.

Trevor Crichton
R&D practical scientist
Chesham, Bucks, UK
2003

I'm a student doing a research project on the electroless plating of cobalt on silicon. However, there is very poor adhesion of the cobalt to the silicon. The plating is carried out at 80 °C and etching and activation are carried out beforehand. Is there anything I can do about it?

Yu Su Wen
student - Singapore
2004

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