I'm trying to etch Ta. The etchant I'm using (HF:HNO3:HCl or lactic acid:HF:HNO3). My film stack contains Cu and SiO2, but either of the etchants do not have selectivity for Ta alone. Both Cu and SiO2 are etched as well. Is there an etchant available that etches only the Ta and leave the Cu and SiO2 alone?
Edmund Lim - Singapore
Strong alkali or solutions that contain free sulfur trioxide, but that will probably get the copper too.
Tom Pullizzi Falls Township, Pennsylvania
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