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Lifting photoresist

2000

A few months ago, I read a subject on this site regarding lifting photoresist during plating. Does anybody recall or know where in the archive I can find this. I'm having problem locating it since there is no search feature for the archives.

Thanks,

Jerome

Jerome M.
Samsung - Suwon, Korea

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You may have been reading a short article on the subject in our on-line library.

P.S.: We have now rectified the shortcoming and have a great search engine. See the very bottom of the page.

Ted Mooney, P.E.
Striving to live Aloha
finishing.com - Pine Beach, New Jersey

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Thanks Ted, that's exactly what I was looking for.

Now a related question. Have you seen a similar problem when plating NiFe 80/20 film? Recently I've seen lifting of photoresist when using chloride based solution. The problem is less likely to appear in a sulphate based solution.

Note that the lifting resist only occurs at narrow spaces, less than 1.2um. (i.e., Resist-plating area-Resist, where plating area is less than 1.2um and resist frames are about 15um wide). All other areas with larger plating surface shows no problems. FYI, application is permalloy plating of Thin Film Magnetic Ahead.

Thanks in advance,

Jerome

Jerome M.
Samsung - Suwon, Korea
2000