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topic 3077

Chem Milling of FeCrAl Films


(1999)

I'm looking for a chemical milling/polishing solution that can cleanly remove sputtered FeCrAl film from a Kapton substrate. The film is masked with photoresist to obtain a pattern. Sputtered film thicknesses range from 50 to 200 angstroms and the nominal composition is Fe-20Cr-5Al. Electropolishing is not applicable and I prefer that the solution not contain HF acid.

W. Steven Spear
Seattle WA


(1999)

Durney's Electroplating Engineering Handbook has several bright dips which may dissolve the iron and chrome and lift off the small amount of aluminum. There is one using low concentrations of oxalic acid, H2O2, and H2SO4. Good Luck, Tom

tom pullizzi monitor
Tom Pullizzi
Falls Township,
   Pennsylvania 



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