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Advantages of pulse bias for PVD

2003

Can anyone explain the advantage to use a "pulsed" DC bias for the substrate compared to normal DC bias for reactive sputtering TiN?
Does "pulsed substrate biasing" change the microstructure of the TiN film?

Thank you.

Agee Yuan
cutting tool maker - Taipei, Taiwan, ROC

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The big advantage for pulsed DC biasing is when depositing insulating coatings, such as aluminum oxide. It is also important when sputter depositing insulating coatings to pulse the bias on the sputter source.

Jim Treglio - scwineryreview.com
PVD Consultant & Wine Lover - San Diego,
California
2003

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Pulsed bias is effective when depositing insulating materials, but it should also be pulsed negatively and positively. With regard to TiN on cutting tools a pulsed bias does provide an advantage over straight DC bias. It will help in creating a more uniform coating over complex geometries, as in hobs and end mills. It is also considered a method of control for structure, by altering the pulse frequency, duration of the off and on times as well as the voltage you can change the growth of the film. There are many papers on the subject in the proceedings from the International Conference on Metallurgically Coatings and thinfilms.

Regards,

Michael Zuraw
- Georgetown, Ontario, Canada
2003

Ed. note: The grammatical error of eliding the space in 'thin film' to the single word 'thinfilm' is the deliberate error of finishing.com to allow more efficient site searches.