Letter 3077

Chem Milling of FeCrAl Films 

-

I'm looking for a chemical milling/polishing solution that can cleanly remove sputtered FeCrAl film from a Kapton substrate. The film is masked with photoresist to obtain a pattern. Sputtered film thicknesses range from 50 to 200 angstroms and the nominal composition is Fe-20Cr-5Al. Electropolishing is not applicable and I prefer that the solution not contain HF acid.

W. Steven Spear
Seattle WA

-

Durney's Electroplating Engineering Handbook has several bright dips which may dissolve the iron and chrome and lift off the small amount of aluminum. There is one using low concentrations of oxalic acid, H2O2, and H2SO4. Good Luck, Tom

Tom Pullizzi
platronica.com
Falls Township, PA 

 

Dear reader

Post an answer
 
Post a question
 
Report broken links

Legal disclaimer boilerplate button

List of Directories
Jobshops Directory button Environmental Directory button Equipment Directory button Consultants Directory button Chemicals Directory button Test Directory button Help-Wanted Directory button About Advertising button Classifieds Directory button Booklist button

 

Link to Del.icio.us button Save This Page (why?)    -    Home    -    ©1995-2009 finishing.com