Letter 7084

Chromic Oxide etch 

+

I need a chromic oxide etch to remove the oxide formed on a NiCr seed layer. After removing the oxide I will perform an electroless Ni plating step. The NiCr sputter target has a 50/50 composition. Would it be better to selectively etch the Cr, pitting the seed layer but improving the overall surface for EN? Ideally I would prefer to have a cap layer of just Ni laid over the NiCr but that currently isn't an option.

TIA

Patrick Franklin
Indigo Systems - Santa Barbara, CA

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