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Letter 7084
Chromic Oxide etch
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I need a chromic oxide etch to remove the oxide formed on a NiCr
seed layer. After removing the oxide I will perform an electroless Ni
plating step. The NiCr sputter target has a 50/50 composition. Would
it be better to selectively etch the Cr, pitting the seed layer but
improving the overall surface for EN? Ideally I would prefer to have
a cap layer of just Ni laid over the NiCr but that currently isn't an
option.
TIA
Patrick Franklin
Indigo Systems - Santa Barbara, CA
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